Hirokawa delivers transmission solutions for a wide range of semiconductor process equipment

Vacuum Robot

Vacuum Robots are essential core components in the transport of semiconductor vacuum process equipment. The Robot’s stability, high accuracy, and efficiency directly impact process stability, yield, and production capacity. Hirokawa’s Vacuum Robots are characterized by high efficiency, precision, and stability. They can be matched to vacuum process equipment requirements or customized in small quantities.

Ferrofluid Robot - Suitable for Handling Materials Such as Silicon Carbide

  • GVM2LSA
    • Advanced Collision Protection
    • Easy programming for complex wafer handling stations
    • Automatic Correction (AWC function)

    Basic Specifications

    Item Specification
    Wafer Size 150mm (Tray/Wafer)
    Wafer gripping method Bottom support type
    Number of axes 3-axis
    Payload (Standard end effector + wafer) / (Per individual end effector) 2kg
    Motion
    Range
    R axis (extension) (*1) -379~505mm (Extension distance varies depending on finger configuration)
    T axis (rotation) 360° (continuous rotation)
    Z axis (lift) 40mm
    Repeat positioning accuracy R(Radial)≤0.05mm(3σ)
    θ(Rotational)≤0.1mm(3σ)
    Z(vertical)≤0.1mm(3σ)
    Mounting method Top Mount/Top Bolt
    Maximum rotation diameter (*2) Φ630mm
    Vacuum Level ≤1.33x10-6 Pa
    Body Weight 30kg

    *1、The extension length value is measured when using Hirokawa standard end effector.
    *2、According to the Hirokawa’s standard end effector, the minimum rotary diameter is 630 mm. The rotary diameter will vary with different finger lengths.

High Vacuum Robot - Suitable for handling in high vacuum environments required for PVD, CVD, etching, etc.

  • GVM3HQF
    • Direct Drive Motor (DD Motor) for highly stable wafer transfer
    • High reliability with MCBF >12M
    • Corrosion Resistance
    • Automatic Correction (AWC function)

    Basic Specifications

    Item Specification
    Applicable wafer dimensions 200mm/300mm
    Motion
    Range
    (R axis) Retraction Range (*1) 951mm (including Termination Actuator) (extension distance varies based on finger variations)
    (TH axis) rotation range 360° (continuous rotation)
    (Z axis) lift range 150mm
    Mounting method Top Mount and Top Bolt
    Body Weight 120kg
    Vacuum Level ≤3E-8Torr
    Leak rate ≤5E-9std·cc/s He
    Repeat positioning accuracy R(Radial)≤0.1mm(3σ)
    θ(Rotational)≤0.1mm(3σ)
    Z(vertical)≤0.05mm(3σ)
    Communication protocol Ethernet(TCP/IP)

    *1、 The extension length value is measured when using Hirokawa standard end effector.

  • GVM3HDA
    • Direct Drive Motor (DD Motor) for highly stable wafer transfer
    • High-reliability MCBF >12M
    • Corrosion Resistance
    • Automatic Correction (AWC function)

    Basic Specifications

    Item Specification
    Applicable wafer dimensions 300mm/200mm
    Motion
    Range
    (R axis) Retraction Range(*1) 968 mm (including end effector) (extension distance varies based on finger variations)
    (TH axis) rotation range 360° (continuous rotation)
    (Z axis) lift range 150mm
    Maximum rotation diameter(*2) ∅855mm
    Body Weight 110kg
    Vacuum Level ≤7.5E-5Torr
    Leak rate ≤5E-9std·cc/s He
    Repeat positioning accuracy R(Radial)≤0.05mm(3σ)
    θ(Rotational)≤0.1mm(3σ)
    Z(vertical)≤0.05mm(3σ)
    Communication protocol Ethernet(TCP/IP)

    *1、The extension length value is measured when using Hirokawa standard end effector.
    *2、According to the Hirokawa’s standard end effector, the minimum rotary diameter is 630 mm. The rotary diameter will vary with different finger lengths.

Other special types of Robot

Let us design a semiconductor wafer transfer technology solution tailored to your specific needs

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